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View Generic Document: Tailored Oriented Microstructures in Thin Metal Films

Citation: Worden, Derek (2007). Tailored Oriented Microstructures in Thin Metal Films. Cornell Center for Materials Research.
Collection: Cornell Center for Materials Research REU Program  
 
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Title Tailored Oriented Microstructures in Thin Metal Films
Author(s) Worden, Derek
Keyword(s) thin metal films
silver
x-ray diffraction
titanium
thin films
orientation
adhesion layer
Abstract/Summary Silver thin films are ideal for use in optics due to their reflective properties and in electronics due to their excellent conductive properties. Silver is easily understood as a bulk material but not as a thin film. Stresses in thin films, due mostly to expansion coefficients, build up differently in (111) and (200) grain orientations. Grains with (111) orientation build up 2.5 times as much stress as (200). It is hard to try and understand these different grains when they are mixed evenly throughout a film. So, in order to develop a further understanding, we need two samples of the film with identical properties; except one is mostly (111) and the other mostly (200). It has been shown that as film thickness increases, the favored orientation shifts from (111) to (200). Due to the poor adhesion of silver, this change is gradual, and by adding an adhesion layer of titanium the transition is quicker. By varying the thicknesses of our films and using X-ray diffraction we can find samples of near similar thickness but different preferred orientations.
Publisher Cornell Center for Materials Research
Date 2007-08-29
Copyright Notice Copyright 2007 CCMR. Materials from the CCMR website may not be used without permission.
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Additional Notes Support for the CCMR is provided through the NSF Grant DMR 0520404, part of the NSF MRSEC Program. Additional support is provided by Cornell University, the State of New York, and by industrial sources.
 
 
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Created: Fri, 18 Jan 2008, 06:36:11 EST by Cathy Lowe. Detailed History


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