The Effect of Simple Chemical Reactions on Functionalized Silicon Surfaces

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View Generic Document: The Effect of Simple Chemical Reactions on Functionalized Silicon Surfaces

Citation:	Theodore, Shamira (2007). The Effect of Simple Chemical Reactions on Functionalized Silicon Surfaces. Cornell Center for Materials Research.
Collection:	Cornell Center for Materials Research REU Program

Title	The Effect of Simple Chemical Reactions on Functionalized Silicon Surfaces
Author(s)	Theodore, Shamira
Keyword(s)	silicon Fourier transform infrared acid absorption spectroscopy monolayers alkaline
Abstract/Summary	The reactivity of dodecoxy-terminated Si(111) surfaces with aqueous acids and bases was investigated using Fourier transform infrared (FTIR) absorption spectroscopy. The monolayers were formed by the reaction of hydrogen-terminated Si(111) surfaces with dodecyl aldehyde at elevated temperature. The functionalized surfaces were then reacted with 1 M solutions of prototypical strong acids and bases. Although little degradation was seen in acid media, the alkaline solutions degraded the monolayers significantly.
Publisher	Cornell Center for Materials Research
Date	2007-08-29
Copyright Notice	Copyright 2007 CCMR. Materials from the CCMR website may not be used without permission.
Copyright Agreement	on
Additional Notes	Support for the CCMR is provided through the NSF Grant DMR 0520404, part of the NSF MRSEC Program. Additional support is provided by Cornell University, the State of New York, and by industrial sources.

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Fri, 18 Jan 2008, 06:36:11 EST by Cathy Lowe. Detailed History