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View Generic Document: Trapping of Metal Nanoparticles in Electromigration Gaps

Citation: Milne, Lauren (2007). Trapping of Metal Nanoparticles in Electromigration Gaps. Cornell Center for Materials Research.
Collection: Cornell Center for Materials Research REU Program  
 
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Title Trapping of Metal Nanoparticles in Electromigration Gaps
Author(s) Milne, Lauren
Keyword(s) metal nanoparticles
electromigration gaps
dielectrophoresis
capillary force
single-electron transistor
SET
deposition
trapping
Abstract/Summary One of the most difficult and least effective parts of the process of creating a single-electron transistor is the attachment of electrical leads to the nanoparticles, as there are very few methods available to effectively manipulate particles at such a small scale. We used two different techniques to deposit nanoparticles: dielectrophoresis and the capillary force exerted by the solvent in which the nanoparticles are suspended.
Publisher Cornell Center for Materials Research
Date 2007-08-29
Copyright Notice Copyright 2007 CCMR. Materials from the CCMR website may not be used without permission.
Copyright Agreement on
Additional Notes Support for the CCMR is provided through the NSF Grant DMR 0520404, part of the NSF MRSEC Program. Additional support is provided by Cornell University, the State of New York, and by industrial sources.
 
 
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Created: Fri, 18 Jan 2008, 06:36:11 EST by Cathy Lowe. Detailed History


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