View Journal Article: High-Throughput Characterization of Pattern Formation in Symmetric Diblock Copolymer Films
Citation:
Smith, Archie, Douglas, Jack, Meredith, J. Carson, Amis, Eric and Karim, Alamgir (2001). High-Throughput Characterization of Pattern Formation in Symmetric Diblock Copolymer Films. Journal of Polymer Science Part B: Polymer Physics 39 (18). 2141-2158.
Collection:
Polymer Publications
Title
High-Throughput Characterization of Pattern Formation in Symmetric Diblock Copolymer Films
Author(s)
Smith, Archie Douglas, Jack Meredith, J. Carson Amis, Eric Karim, Alamgir
Keyword(s)
combinatorial methods combinatorial measurements surface pattern thin film block copolymer
Abstract/Summary
Surface-pattern formation in thin block copolymer films was investigated by utilizing a high-throughput methodology to validate the combinatorial measurement approach and to
demonstrate the value of the combinatorial method for scientific investigation. We constructed measurement libraries from images of subregions of block copolymer films having gradients in
filmthickness and a range of molecular mass, M. A single gradient film covers a wide range of film morphologies and contains information equivalent to a large number of measurements of films having
a fixed thickness, h. Notably, the scale of the surface patterns is generally much larger than the molecular dimensions so that the interpretation of the patterns is more subtle than ordering in
bulk block copolymer materials, and there is no predictive theory of this type of surface-pattern formation. We observed a succession of surface patterns that repeat across the film with increasing
h [extended smooth regions, regions containing circular islands, labyrinthine (“spinodal”) patterns, holes, and smooth regions again]. The extended smooth regions and the labyrinthine patterns
appear to be novel features revealed by our combinatorial study, and these patterns occurred as bands of h that were quantized by integral multiples of the bulk lamellar period, Lo. The magnitude
of the height gradient influenced the width of the bands, and the smooth regions occupied an increasing fraction of the film-surface area with an increasing film gradient. The average size of the
spinodal patterns, l, was found to scale as l; Lo 22.5 or l; M21.65 and reached a limiting size at long annealing times. The hole and island features had a size comparable to l, and their size
likewise decreased with increasingM. The smooth regions were attributed to an increase in the surface-chain density in the outer brushlike block copolymer layer with increasing h, and the scaling
of l with M was interpreted in terms of the increasing surface elasticity withM. © 2001 John Wiley&Sons, Inc. J Polym Sci Part B: Polym Phys 39: 2141–2158, 2001
Publisher
John Wiley & Sons, Inc.
Date
2001-09-15
Copyright Notice
http://www.nist.gov/public_affairs/disclaim.htm
Journal
Journal of Polymer Science Part B: Polymer Physics
Volume
39
Pages
2141-2158
Issue
18
Copyright Agreement
on
Additional Notes
Journal of Polymer Science Part B: Polymer Physics, Volume 39(18) , 2141 - 2158 (2001)
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View Journal Article: High-Throughput Characterization of Pattern Formation in Symmetric Diblock Copolymer Films 