View Journal Article: Characterization of Symmetric Diblock Copolymers with High Throughput Techniques
Citation:
Karim, Alamgir, Smith, Archie, Douglas, Jack and Amis, Eric (2001). Characterization of Symmetric Diblock Copolymers with High Throughput Techniques. Polymer Preprints42 (1). 283-284.
Thin films of symmetric diblock copolymers have been observed to form surface patterns of circular holes and island structures. Previous work has shown that the holes and islands
form when the total film thickness, h, deviates substantially from multiples of the bulk lamellar thickness, Lo, of the bulk block copolymer material, h ≈ (m + ½)Lo, m an integer. There has been
relatively little study, however, of the factors that govern the size of these surface patterns at long times and there is no predictive theory of this novel surface pattern formation. Notably,
these surface patterns can be remarkably large in size in comparison to Lo, (or even h) and there has been no previous experimental study of the thickness range over which the block copolymer films
remain smooth. In the present work, we develop a flow gradient technique to cast films having a continuous range of thickness and a range of molecular mass, M, to combinatorically study block
copolymer films in order to identify aspects of this type of pattern formation.
Publisher
Division of Polymer Chemistry, Inc., American Chemical Society