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View Generic Document: X-Ray Diffraction Studies of Pulsed Laser Deposition

Citation: Ferguson, John (2004). X-Ray Diffraction Studies of Pulsed Laser Deposition. Cornell Center for Materials Research.
Collection: Cornell Center for Materials Research REU Program  
 
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Title X-Ray Diffraction Studies of Pulsed Laser Deposition
Author(s) Ferguson, John
Keyword(s) pulsed laser deposition
pervoskite molecules
X-Ray diffraction
thin films
Abstract/Summary Pulsed laser deposition is an extremely effective method of growing thin films of materials on substrates. In this particular experiment the deposition of various pervoskite molecules onto different substrates were monitored via x-ray diffraction from a synchrotron source. Molecular compounds that were chosen were CaTiO3, SrTiO3, and BaTiO3 due to there structural similarities and correspondingly different lattice constants. The lattice constants for CaTiO3, SrTiO3, and BaTiO3 are 3.80, 3.90, and 4.06 respectively. These materials all have the same valence structure. Based upon the intensities of the diffracted x-rays at the anti-Bragg peak position, the growth of the film was monitored on a monolayer by monolayer scale at 750°C. The film quality of CaTiO3 on SrTiO3 and BaTiO3 on SrTiO3 were compared to a homoepitaxial film of SrTiO3 to determine how the strain at the interface affected growth. It was determined that the tensilely strain film, CaTiO3, grew more smoothly than the ompressively strained material BaTiO3.
Publisher Cornell Center for Materials Research
Date 2004-08-17
Copyright Notice Copyright 2006 CCMR. Materials from the CCMR website may not be used without permisson.
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Additional Notes Support for this REU program is provided through the National Science Foundation Materials Research Science and Engineering Centers (MRSEC) Program (DMR-0079992) and the REU-Site program (DMR-0097494). Additional funding is provided by Cornell University.
 
 
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Created: Tue, 17 Oct 2006, 00:30:29 EST Detailed History


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